The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2020
Filed:
Sep. 20, 2012
Corning Incorporated, Corning, NY (US);
Yoko Ejiri, Tsukuba, JP;
Satoru Ayano, Tsukuba, JP;
Masaya Hosoda, Tsukuba, JP;
Go Tazaki, Tsukuba, JP;
Corning Incorporated, Corning, NY (US);
Abstract
Provided are a method capable of evaluating adherent cells under an environment similar to an in vivo environment by a culture method similar to a two-dimensional culture, and applications thereof. An adherent cell culture method uses, as a culture chamber (), a chamber in which two or more culture spaces each having an equivalent diameter (D) that is 1 to 5 times the diameter of a desired spheroid and each having a height (H) that is 0.3 to 5 times the equivalent diameter are arranged and a surface of each of the culture spaces has a water contact angle of 45 degrees or less. Spheroids of adherent cells are cultured in the respective culture spaces () arranged in the culture chamber ().