The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2020

Filed:

Apr. 25, 2017
Applicant:

Sumitomo Electric Hardmetal Corp., Itami-shi, JP;

Inventors:

Kouhei Yoshimura, Sorachi-gun, JP;

Shinya Imamura, Sorachi-gun, JP;

Hideaki Kanaoka, Sorachi-gun, JP;

Anongsack Paseuth, Sorachi-gun, JP;

Satoshi Ono, Sorachi-gun, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01); B26B 9/00 (2006.01); B32B 15/04 (2006.01); C23C 16/40 (2006.01); C23C 16/02 (2006.01); C23C 16/455 (2006.01); C23C 16/34 (2006.01); C23C 16/36 (2006.01);
U.S. Cl.
CPC ...
B26B 9/00 (2013.01); B32B 15/04 (2013.01); C23C 16/029 (2013.01); C23C 16/0272 (2013.01); C23C 16/34 (2013.01); C23C 16/36 (2013.01); C23C 16/403 (2013.01); C23C 16/45523 (2013.01);
Abstract

A surface-coated cutting tool includes a base material and a coating formed on the base material. The coating includes an α-AlOlayer. The α-AlOlayer contains a plurality of α-AlOcrystal grains and chlorine, and has a TC(006) of more than 5 in texture coefficient TC(hkl). The α-AlOlayer includes lower and upper layers, the lower layer is located closer to the base material than the upper layer is, and the upper layer is located opposite to the base material across the lower layer, in a thickness direction of the α-AlOlayer. The lower layer has a thickness of 1.0 μm. The upper layer has a thickness of 0.5 μm or more. The chlorine in the lower layer has a concentration distribution in which an atomic concentration Cof the chlorine decreases in a direction away from the base material, in a thickness direction of the lower layer.


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