The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2020

Filed:

Feb. 01, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Wendell Glenn Boyd, Jr., Morgan Hill, CA (US);

Jim Zhongyi He, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/14 (2012.01); B24B 37/04 (2012.01); B24B 37/10 (2012.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01); C23C 16/513 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
B24B 37/14 (2013.01); B24B 37/044 (2013.01); B24B 37/105 (2013.01); H01L 21/6831 (2013.01); H01L 21/6875 (2013.01); H01L 21/68757 (2013.01); C23C 16/513 (2013.01); H01J 37/32715 (2013.01); H01J 2237/3321 (2013.01);
Abstract

Methods of polishing a patterned surface of an electrostatic chucking (ESC) substrate support to be used in plasma assisted or plasma enhanced semiconductor manufacturing chambers are provided herein. In particular, embodiments described herein, provide polishing methods that round and debur the edges of elevated features and remove dielectric material from the non-substrate contacting surfaces of a patterned substrate support to reduce defectivity associated therewith.


Find Patent Forward Citations

Boyd, Jr., Wendell. (2020). Polishing of electrostatic substrate support geometries (U.S. Patent No. 10654147). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10654147

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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