The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2020

Filed:

Sep. 06, 2018
Applicant:

Samsung Display Co. Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

Moon Won Chang, Hwaseong-si, KR;

Oh June Kwon, Hwaseong-si, KR;

Soo Youn Kim, Siheung-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 51/52 (2006.01); H01L 51/56 (2006.01); H01L 51/50 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0011 (2013.01); H01L 51/5253 (2013.01); H01L 51/56 (2013.01); H01L 27/3241 (2013.01); H01L 51/5012 (2013.01);
Abstract

A deposition mask includes: a plurality of sub-masks through which deposition material passes to a base layer to form a deposition layer defining a hole therein, each of the sub-masks including: an aperture through which the deposition material passes to the base layer, a total planar area of the aperture corresponding to less than a total planar area of the deposition layer, and a masking surface at which the deposition material does not pass through the sub-mask, the masking surface including a hole-forming portion of which a total planar area thereof corresponds to a total planar area of the hole defined in the deposition layer. The hole-forming portions of the sub-masks have a same shape and planar area as each other, and within each sub-mask, the shape of the hole-forming portion is nested within a shape of the aperture.


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