The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
Jan. 10, 2019
Hitachi High-tech Science Corporation, Tokyo, JP;
Masahiro Sakuta, Tokyo, JP;
Yoshiki Matoba, Tokyo, JP;
HITACHI HIGH-TECH SCIENCE CORPORATION, Tokyo, JP;
Abstract
Disclosed is an apparatus for and a method of mass analysis, the apparatus and the method being capable of improving a detection accuracy of a target substance including impurities, without increasing a size of the apparatus, and shortening measuring time. The apparatus analyzing a sample containing a target substance and one or more interfering substances, which have a peak of a mass spectrum overlapping that of the target substance includes: a peak correction unit calculating an intensity of net peak D of the mass spectrum of the target substance by subtracting a total sum of estimated intensities of the peak B, which are calculated every predetermined time interval according to the intensity of the peak A and a nonlinear relation F between the peak A and the peak B, from an intensity of peak C of a mass spectrum of the target substance of the sample.