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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10651009 B1

PDFFull Text
Date of Patent:
May. 12, 2020

Filed:

Jul. 20, 2015

Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope

Applicant:

Delmic B.v., Delft, NL;

Inventors:

Jacob Pieter Hoogenboom, Delft, NL;

Nalan Liv Hamarat, Delft, NL;

Pieter Kruit, Delft, NL;

Assignee:

DELMIC IP B.V., Delft, NL;

Attorney:

Womble Bond Dickinson (US) LLP

Primary Examiner:

Nathnael Aynalem

Int. Cl.
CPC ...
G01N 23/225 (2018.01); H01J 37/22 (2006.01); G01N 21/64 (2006.01); G02B 21/24 (2006.01); G02B 21/34 (2006.01); G02B 21/36 (2006.01); H01J 37/20 (2006.01); H01J 37/21 (2006.01); H01J 37/28 (2006.01); G01N 23/2251 (2018.01);
U.S. Cl.
CPC ...
H01J 37/228 (2013.01); G01N 21/6458 (2013.01); G01N 23/2251 (2013.01); G02B 21/244 (2013.01); G02B 21/34 (2013.01); G02B 21/365 (2013.01); G02B 21/368 (2013.01); H01J 37/20 (2013.01); H01J 37/21 (2013.01); H01J 37/28 (2013.01); G01N 2223/408 (2013.01); H01J 2237/2003 (2013.01); H01J 2237/2826 (2013.01);
Abstract

The invention relates to a method for inspecting a sample with an assembly comprising a scanning electron microscope (SEM) and a light microscope (LM). The assembly comprises a sample holder for holding the sample. The sample holder is arranged for inspecting the sample with both the SEM and the LM, preferably at the same time. The method comprising the steps of: capturing a LM image of the sample in its position for imaging with the SEM; determining a position and dimensions of a region of interest in or on the sample using the LM image; determining values to which the SEM parameters need to be set to image the sample at a desired resolution; and capturing a SEM image of the region of interest, preferably using the first electron beam exposure of said region of interest.

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