The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2020

Filed:

Aug. 07, 2018
Applicant:

Mstar Semiconductor, Inc., Hsinchu Hsien, TW;

Inventor:

Ren-You Huang, Hsinchu Hsien, TW;

Assignee:

XIAMEN SIGMASTAR TECHNOLOGY LTD, Shamen, Fujian, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 3/40 (2006.01); G06T 7/55 (2017.01); G06T 7/30 (2017.01); G06T 7/73 (2017.01);
U.S. Cl.
CPC ...
G06T 3/4038 (2013.01); G06T 7/30 (2017.01); G06T 7/55 (2017.01); G06T 7/73 (2017.01); G06T 2207/20212 (2013.01);
Abstract

An image stitching method and an image stitching device for stitching a first image and a second image are presented. The image stitching method includes: calculating, according to pixel values of the first image and the second image in an overlapping area, a plurality of costs respectively corresponding to a plurality of positions in the overlapping area; calculating, according to the plurality of costs and relative distances between the plurality of positions, a plurality of forward regularized cumulative costs respectively corresponding to the plurality of positions in the overlapping area; determining a seam in the overlapping area according to the plurality of forward regularized cumulative costs, wherein the seam includes a plurality of stitching positions; and stitching the first image and the second image on the basis of the seam to generate a stitched image.


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