The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2020

Filed:

Nov. 30, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Daniel Corliss, Waterford, NY (US);

Derren N. Dunn, Sandy Hook, CT (US);

Michael A. Guillorn, Cold Springs, NY (US);

Shawn P. Fetterolf, Cornwall, VT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); H01L 23/58 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5054 (2013.01); G06F 17/5063 (2013.01); H01L 21/027 (2013.01); H01L 23/58 (2013.01); G06F 2217/14 (2013.01); G06F 2217/68 (2013.01);
Abstract

An embodiment of the invention may include a method for ensuring semiconductor design integrity. The method may include analyzing a photomask design for a semiconductor circuit. The photomask may include a primary electrical design necessary for the operation of the semiconductor circuit, and white space, which has no primary electrical design. The method may include inserting a secondary electrical design into the white space of the photomask design for the semiconductor circuit. The secondary electrical design may have known electrical properties for validating the semiconductor circuit design.


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