The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
Aug. 23, 2017
Express Scripts, Inc., St. Louis, MO (US);
Blayne S. Lequeux, Dana Point, CA (US);
Express Scripts Strategic Development, Inc., St. Louis, MO (US);
Abstract
Systems and methods for integrating data are described. In an example embodiment, a plurality of data attributes of comparison data and the plurality of data attributes of a master record are respectively compared to determine that there is a difference, the comparison data originating from a data source. A relative level of source priority of the data source of the comparison data is determined relative to the data source of a current state version of the master record in accordance with source evaluation criteria. The current state version of the master record is stored in reference data based on a determination that there is a difference and that the source priority of the data source of the comparison data is equal to or greater than the data source of the current state version of the master record. Mapped comparison data is used to update the current state version of the master record based on the determination that there is a difference and that the source significance of the data source of the comparison data is equal to or greater than the data source of the current state version of the master record to create an updated state version of the master record, the mapped comparison data being based on the comparison data. Additional methods and systems are disclosed.