The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2020

Filed:

Dec. 21, 2017
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventor:

Kenta Matsubara, Ashigarakami-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 21/14 (2006.01); G02B 21/26 (2006.01); G02B 7/36 (2006.01); G02B 21/06 (2006.01); G02B 7/28 (2006.01); G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
G02B 21/14 (2013.01); G02B 7/28 (2013.01); G02B 7/282 (2013.01); G02B 7/36 (2013.01); G02B 21/0004 (2013.01); G02B 21/06 (2013.01); G02B 21/26 (2013.01);
Abstract

A culture vessel that houses a culture liquid and a specimen is irradiated with pattern light having a pattern that is previously set for the culture vessel. Transmitted light transmitted through the culture liquid in the culture vessel because of the irradiation with the pattern light is detected. Optical characteristics of an adjusting optical system that adjusts refraction of light caused by the shape of the liquid surface of the culture liquid in the culture vessel are adjusted, on the basis of a detection signal based on the detected transmitted light. After the adjustment, the culture vessel is irradiated with illumination light for phase-contrast measurement, and the specimen irradiated with the illumination light is imaged.


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