The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
Jul. 20, 2017
Canon Kabushiki Kaisha, Tokyo, JP;
Yoshinori Kotani, Yokohama, JP;
Kenichi Iida, Kawasaki, JP;
Satoshi Yamabi, Yokohama, JP;
Motokazu Kobayashi, Yokohama, JP;
Shinichirou Yoshikawa, Nagareyama, JP;
Toshihiko Sugimoto, Yokohama, JP;
Takeshi Honma, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A film forming method includes forming a film on a substrate, in which the film includes first regions, second regions, and third regions, the first regions, the second regions, and the third regions being defined by a refractive index and a region size and being present in a mixed manner in a cross section parallel to a thickness direction, the first regions and the second regions have a refractive index at least 0.4 higher than the third regions, the second regions are formed of high-refractive-index particles having an average particle size of 10 nm or more and 100 nm or less, the first regions are formed of the high-refractive-index particles that have been aggregated, the first regions having an equivalent circular diameter of 250 nm or more, and the third regions have an equivalent circular diameter of more than 100 nm.