The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Aug. 09, 2018
Applicant:

Trumpf Lasersystems for Semiconductor Manufacturing Gmbh, Ditzingen, DE;

Inventors:

Jens Brunne, Stuttgart, DE;

Matthias Wissert, Stuttgart, DE;

Guenther Krauss, Ditzingen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/00 (2006.01); G03F 7/20 (2006.01); H05G 2/00 (2006.01); H01S 3/223 (2006.01); H01S 3/23 (2006.01);
U.S. Cl.
CPC ...
H01S 3/0064 (2013.01); G03F 7/70033 (2013.01); H05G 2/008 (2013.01); H01S 3/2232 (2013.01); H01S 3/23 (2013.01);
Abstract

Driver laser systems for EUV radiation producing apparatuses are disclosed that include a beam source for producing laser radiation propagating in a first direction, an amplifier arrangement comprising at least one optical amplifier for amplifying the laser radiation propagating in the first direction, and at least one optical isolator. The optical isolator includes a chamber filled with a gas, through which chamber the laser radiation propagating in the first direction passes, and a plasma generating device configured for the pulsed ignition of a plasma in the gas of the chamber to suppress passage of laser radiation propagating in a second direction, opposite to the first direction, through the chamber. EUV radiation producing apparatuses that include such driver laser systems are also disclosed.


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