The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Mar. 14, 2017
Applicant:

Universita' Degli Studi Di Milano Bicocca, Milan, IT;

Inventors:

Richard Noetzel, Eindhoven, NL;

Stefano Sanguinetti, Abbiategrasso, IT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01M 4/04 (2006.01); C30B 25/02 (2006.01); C30B 29/40 (2006.01); H01L 21/02 (2006.01); H01M 4/88 (2006.01); C30B 33/06 (2006.01); H01G 9/20 (2006.01); C30B 23/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/0421 (2013.01); C30B 25/02 (2013.01); C30B 29/403 (2013.01); C30B 33/06 (2013.01); H01G 9/205 (2013.01); H01L 21/0254 (2013.01); H01L 21/02381 (2013.01); H01L 21/02433 (2013.01); H01M 4/8867 (2013.01); H01M 4/8878 (2013.01); C30B 23/02 (2013.01); H01L 21/02664 (2013.01); Y02E 10/542 (2013.01); Y02E 60/13 (2013.01);
Abstract

It is described a method for realizing catalytically active electrochemical electrodes with maximized surface area. In the method, InGaN is deposited epitaxially in form of a thin layer on a Silicon substrate exposing a (111) crystal fac, thus forcing the InGaN electrode material to grow exposing a catalytically active surface. The substrate is then removed, the InGaN layer is made into fragments and these are transferred onto a conductive support with one-, two- or three-dimensional structure which can be a wire, a two-dimensional conductive foil which, possibly folded, or a three-dimensional conductive fabric, sponge or cage-like structure. It is thus possible to obtain an InGaN-based electrode with increased surface area and exposing surfaces with high catalytic activity.


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