The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Jul. 13, 2016
Applicant:

Osram Opto Semiconductors Gmbh, Regensburg, DE;

Inventor:

Kai Gehrke, Oldenburg, DE;

Assignee:

OSRAM OLED GMBH, Regensburg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/38 (2010.01); H01L 33/42 (2010.01); H01L 33/32 (2010.01); H01L 33/44 (2010.01); H01L 33/62 (2010.01);
U.S. Cl.
CPC ...
H01L 33/38 (2013.01); H01L 33/32 (2013.01); H01L 33/387 (2013.01); H01L 33/42 (2013.01); H01L 33/44 (2013.01); H01L 33/62 (2013.01);
Abstract

In one embodiment, the optoelectronic semiconductor chip () comprises a first semiconductor region () of a first conductivity type and a second semiconductor region () of a second conductivity type. An active zone () configured for generating light is situated between these two semiconductor regions (). A first electric contact layer () is situated directly at the first semiconductor region () in places. Furthermore, a second electric contact layer () is situated directly at the second semiconductor region () in places, wherein the semiconductor regions () are energized by way of the contact layers (). Furthermore, two metallic current leads () and an insulation layer () are present. The insulation layer () covers the second semiconductor region () directly in places and rises over the latter. Further, the insulation layer () is situated below the current lead () for the second semiconductor region (). Both contact layers () are produced from a transparent conductive oxide and the first contact layer () is formed directly over the second contact layer () and also over the insulation layer ().


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