The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Jan. 31, 2018
Hitachi Metals, Ltd., Minato-ku, Tokyo, JP;
Futoshi Kuniyoshi, Minato-ku, JP;
HITACHI METALS, LTD., Tokyo, JP;
Abstract
A sintered R1-T-B based magnet work and an R2-Ga alloy are provided. The sintered magnet work contains R: 27.5 to 35.0 mass %, B: 0.80 to 0.99 mass %, Ga: 0 to 0.8 mass %, M: 0 to 2 mass % (where M is at least one of Cu, Al, Nb and Zr), and T: 60 mass % or more. A diffusion step of, while keeping at least a portion of the R2-Ga alloy in contact with at least a portion of a surface of the sintered magnet work, performing a first heat treatment at a temperature which is not lower than 700° C. and not higher than 950° C. to increase the RH amount contained in the sintered magnet work by not less than 0.05 mass % and not more than 0.40 mass %, is performed; and a second heat treatment is performed at a temperature which is not lower than 450° C. and not higher than 750° C. but which is lower than the temperature of the first heat treatment.