The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Feb. 07, 2018
Applicant:
Shimadzu Corporation, Kyoto, JP;
Inventors:
Takahiro Doki, Kizugawa, JP;
Yukihisa Wada, Soraku-gun, JP;
Satoshi Tokuda, Kusatsu, JP;
Nobukazu Hayashi, Kyoto, JP;
Toshinori Yoshimuta, Takatsuki, JP;
Assignee:
Shimadzu Corporation, Nakagyo-ku, Kyoto-shi, Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/06 (2006.01); G02B 5/18 (2006.01); G01B 15/00 (2006.01); G21K 1/02 (2006.01);
U.S. Cl.
CPC ...
G21K 1/062 (2013.01); G01B 15/00 (2013.01); G21K 1/025 (2013.01); G21K 1/06 (2013.01); G21K 2207/005 (2013.01);
Abstract
The method of producing this diffraction grating includes a step of generating a moire by a periodic pattern projected onto a plurality of unit diffraction gratings and a plurality of unit diffraction gratings, and a step of adjusting so that the extending directions of the gratings are aligned by relatively rotating at least one of a plurality of unit diffractions with respect to at least one of the others of the plurality of unit diffractions.