The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Jun. 03, 2016
Canon Kabushiki Kaisha, Tokyo, JP;
Takahiro Matsumoto, Utsunomiya, JP;
Kenichi Kobayashi, Utsunomiya, JP;
Takafumi Miyaharu, Utsunomiya, JP;
Yosuke Murakami, Utsunomiya, JP;
Tatsuya Hayashi, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint apparatus includes a substrate holding unit. A generation unit generates heating distribution data indicating distribution of a heat value to be applied to a region to be processed. A heating unit gives heat to the region to be processed to deform the region. An obtaining unit which obtains first information defined based on a difference of shapes of the region and a pattern portion of the mold, and second information about a deformation amount of the region. The second information is obtained, by trying deformation of the region to be processed by the heating unit while the substrate holding unit attracts the substrate. A patterning unit forms the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated, in which the generation unit generates the heating distribution data based on the obtained first and second information.