The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Mar. 31, 2017
Lg Chem, Ltd., Seoul, KR;
Dae Han Seo, Daejeon, KR;
Dong Chang Choi, Daejeon, KR;
Kwang Han Park, Daejeon, KR;
Sang Choll Han, Daejeon, KR;
Jae Jin Kim, Daejeon, KR;
Eun Joo Choi, Daejeon, KR;
Min Soo Song, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
The present invention relates to a photomask and a method for manufacturing a column spacer for a color filter using the same, and according to one aspect of the present invention, a photomask is provided, which comprises a central region having a first transmittance, a first perimeter region surrounding the central region and having a second transmittance lower than the first transmittance, and a second perimeter region surrounding the first perimeter region and having the first transmittance.