The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Jan. 31, 2017
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Kang Soo Han, Seoul, KR;

Eun Jung Kim, Suwon-si, KR;

Gug Rae Jo, Asan-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02B 5/30 (2006.01); G02F 1/1339 (2006.01); G02F 1/1333 (2006.01); G02F 1/1343 (2006.01); G02F 1/1362 (2006.01); G02F 1/1368 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133528 (2013.01); G02B 5/3058 (2013.01); G02F 1/1339 (2013.01); G02F 1/133536 (2013.01); G02F 1/1368 (2013.01); G02F 1/133512 (2013.01); G02F 1/134309 (2013.01); G02F 1/136227 (2013.01); G02F 2001/133388 (2013.01); G02F 2001/133538 (2013.01); G02F 2001/133548 (2013.01); G02F 2001/133565 (2013.01); G02F 2201/121 (2013.01);
Abstract

A polarizer including: a base layer including a first area and a second area enclosing the first area; a polarizing part disposed on the first area of the base layer and including a plurality of linear patterns spaced apart from each other; a dummy part disposed on the second area of the base layer and spaced apart from the polarizing part; and a hard mask residue part disposed on a portion of the second area of the base layer between the polarizing part and the dummy part and contacting the base layer. The polarizing part and the dummy part include a metal layer disposed on the base layer, and a hard mask layer disposed on the metal layer and comprising the same material as the hard mask residue part.


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