The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Nov. 19, 2018
Applicant:

Toppan Printing Co., Ltd., Tokyo, JP;

Inventor:

Eiichi Higashikawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D06N 7/00 (2006.01); B32B 27/20 (2006.01); B32B 33/00 (2006.01); E04F 13/08 (2006.01); B32B 27/00 (2006.01); C09D 11/02 (2014.01); C09C 1/28 (2006.01); D21H 27/20 (2006.01); B32B 3/26 (2006.01); B32B 27/40 (2006.01); B44C 1/10 (2006.01); E04F 13/00 (2006.01);
U.S. Cl.
CPC ...
D06N 7/0002 (2013.01); B32B 27/00 (2013.01); B32B 27/20 (2013.01); B32B 33/00 (2013.01); C09C 1/28 (2013.01); C09D 11/02 (2013.01); D21H 27/20 (2013.01); E04F 13/08 (2013.01); B32B 3/263 (2013.01); B32B 27/40 (2013.01); B32B 2451/00 (2013.01); B32B 2607/02 (2013.01); B44C 1/105 (2013.01); D06N 2203/068 (2013.01); E04F 13/002 (2013.01); Y10T 428/24876 (2015.01);
Abstract

In a decorative material, a matting agent is added to, of a first gloss-adjusting layer and a second gloss-adjusting layer, one with lower gloss, where the matting agent has a particle diameter of less than 1.0 times the thickness of the gloss-adjusting layer with lower gloss. The matting agent can be thereby exposed to the surface while floating in the gloss-adjusting layer. Accordingly, a sufficient matting effect can be obtained in front observation, and unevenness imparted to the surface can be reduced; thus, the effect of scattering obliquely entering light is weakened, and the matting effect can be reduced when observed obliquely. Therefore, a picture pattern expressed by the difference in gloss, i.e., a design, can be made invisible when observed obliquely.


Find Patent Forward Citations

Loading…