The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Dec. 03, 2015
Applicant:

Nippon Shokubai Co., Ltd., Osaka-shi, Osaka, JP;

Inventors:

Motohiro Imura, Himeji, JP;

Shin-ichi Fujino, Himeji, JP;

Ryota Wakabayashi, Himeji, JP;

Kozo Nogi, Himeji, JP;

Koji Honda, Himeji, JP;

Yoshiki Katada, Himeji, JP;

Kenji Kadonaga, Himeji, JP;

Assignee:

NIPPON SHOKUBAI CO., LTD., Osaka-shi, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 120/06 (2006.01); C08F 2/14 (2006.01); C08L 33/02 (2006.01); C08F 20/06 (2006.01); B01J 19/18 (2006.01); C08J 3/24 (2006.01);
U.S. Cl.
CPC ...
C08F 120/06 (2013.01); B01J 19/1812 (2013.01); C08F 2/14 (2013.01); C08F 20/06 (2013.01); C08J 3/245 (2013.01); C08L 33/02 (2013.01); B01J 2219/24 (2013.01); C08F 2810/20 (2013.01); C08J 2333/02 (2013.01);
Abstract

[Object] To provide a method for stably producing a water-absorbent resin in powder form or particle form, which has excellent physical properties such as water absorption performance and the like, without any production trouble. [Solution] A method for producing a water-absorbent resin includes mixing a monomer composition, which contains at least a monomer and a pyrolytic polymerization initiator, with an organic solvent, a temperature of the organic solvent is not lower than 70° C. at time of mixing, and when a mass per unit time of the monomer in the monomer composition to be mixed with the organic solvent is expressed as an amount per unit volume of the organic solvent, a lower limit is 0.01 g/ml/min, and an upper limit is 0.2 g/ml/min.


Find Patent Forward Citations

Loading…