The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Aug. 01, 2017
Han's Laser Technology Industry Group Co., Ltd., Shenzhen, Guangdong, CN;
Jian Yuan, Guangdong, CN;
Xilu Li, Guangdong, CN;
Yangting Qi, Guangdong, CN;
Hao Yang, Guangdong, CN;
Yunfeng Gao, Guangdong, CN;
HAN'S LASER TECHNOLOGY INDUSTRY GROUP CO., LTD., Shenzhen, CN;
Abstract
An enhanced digital light processing-based mask projection stereolithography method and apparatus are disclosed, where the apparatus comprises: a control platform capable of slicing a model of a to-be-prototyped object into layers, converting the layer into a bitmap, and further dividing the layer into a main body area and boundary filling areas; a digital light processing unit that is controlled by the control platform and capable of emitting a first light beam used for the corresponding main body area of the layer of the to-be-prototyped object; and a laser marking unit that is controlled by the control platform and capable of emitting a second light beam used for the corresponding boundary filling areas of the layer of the to-be-prototyped object. The present invention can not only implement high-speed prototyping but also avoid an edge distortion, thereby improving precision of object prototyping.