The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

May. 01, 2018
Applicant:

Emagin Corporation, Hopewell Junction, NY (US);

Inventors:

Evan P. Donoghue, Hopewell Junction, NY (US);

Kerry Tice, Hopewell Junction, NY (US);

Ilyas I. Khayrullin, Hopewell Junction, NY (US);

Fridrich Vazan, Pittsford, NY (US);

Tariq Ali, Hopewell Junction, NY (US);

Laurie Sziklas, Hopewell Junction, NY (US);

Amalkumar P. Ghosh, Hopewell Junction, NY (US);

Assignee:

eMagin Corporation, Hopewell Junction, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 27/32 (2006.01); H01L 51/56 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0012 (2013.01); H01L 27/3244 (2013.01); H01L 51/001 (2013.01); H01L 51/0011 (2013.01); H01L 51/5036 (2013.01); H01L 51/56 (2013.01); H01L 27/322 (2013.01); H01L 27/3211 (2013.01); H01L 51/504 (2013.01); H01L 2227/323 (2013.01);
Abstract

An apparatus and method for performing material deposition on an active-matrix organic light emitting diode (AMOLED) display array on a substrate, includes aligning a shadow mask to a first position relative to the substrate; initially depositing a first material through the shadow mask onto the substrate at a first material deposition position relative to the first position of the aligned shadow mask and at a first deposition height; incrementing the position the shadow mask to a second position relative to the first material deposition position; and subsequently depositing one of the first material or a second material through the shadow mask onto the substrate at a second material deposition position relative to the first material deposition position, wherein the second material deposition position having an identical deposition pattern as the first material deposition position on account of the shadow mask.


Find Patent Forward Citations

Loading…