IDiyas

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10636935 B1

PDFFull Text
Date of Patent:
Apr. 28, 2020

Filed:

Aug. 21, 2017

Ion implant system having grid assembly

Applicant:

Intevac, Inc., Santa Clara, CA (US);

Inventors:

Babak Adibi, Los Altos, CA (US);

Moon Chun, San Jose, CA (US);

Assignee:

Intevac, Inc., Santa Clara, CA (US);

Attorneys:

Womble Bond Dickinson (US) LLP

Joseph Bach

Primary Examiner:

Edward Chin

Int. Cl.
CPC ...
H01L 31/068 (2012.01); C23C 14/48 (2006.01); H01L 31/18 (2006.01); C23C 14/04 (2006.01); H01J 37/32 (2006.01); H01L 21/223 (2006.01); H01J 37/18 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1876 (2013.01); C23C 14/042 (2013.01); C23C 14/48 (2013.01); H01J 37/185 (2013.01); H01J 37/3171 (2013.01); H01J 37/32412 (2013.01); H01J 37/32422 (2013.01); H01L 21/2236 (2013.01); H01L 31/068 (2013.01); H01L 31/0682 (2013.01); H01L 31/1804 (2013.01); H01L 31/1864 (2013.01); H01J 2237/0437 (2013.01); H01J 2237/184 (2013.01); H01J 2237/201 (2013.01); H01J 2237/327 (2013.01); H01J 2237/3365 (2013.01); Y02E 10/547 (2013.01); Y02P 70/521 (2015.11);
Abstract

An ion implantation system having a grid assembly. The system includes a plasma source configured to provide plasma in a plasma region; a first grid plate having a plurality of apertures configured to allow ions from the plasma region to pass therethrough, wherein the first grid plate is configured to be biased by a power supply; a second grid plate having a plurality of apertures configured to allow the ions to pass therethrough subsequent to the ions passing through the first grid plate, wherein the second grid plate is configured to be biased by a power supply; and a substrate holder configured to support a substrate in a position where the substrate is implanted with the ions subsequent to the ions passing through the second grid plate.

Find Patent Forward Citations

Loading…