The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Dec. 11, 2018
Applicant:

Research & Business Foundation Sungkyunkwan University, Suwon-si, KR;

Inventors:

Woo Jong Yu, Suwon-si, KR;

Ui Yeon Won, Ansan-si, KR;

Vu Quoc An, Suwon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11521 (2017.01); H01L 29/66 (2006.01); H01L 27/11526 (2017.01); G11C 16/26 (2006.01); G11C 16/10 (2006.01); G11C 16/14 (2006.01); G11C 13/02 (2006.01); H01L 29/78 (2006.01); H01L 51/00 (2006.01); H01L 29/16 (2006.01); G11C 16/04 (2006.01); H01L 29/788 (2006.01); H01L 29/775 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11521 (2013.01); G11C 13/025 (2013.01); G11C 16/0408 (2013.01); G11C 16/10 (2013.01); G11C 16/14 (2013.01); G11C 16/26 (2013.01); H01L 27/11526 (2013.01); H01L 29/1606 (2013.01); H01L 29/66825 (2013.01); H01L 29/78 (2013.01); H01L 51/0048 (2013.01); H01L 29/0676 (2013.01); H01L 29/775 (2013.01); H01L 29/788 (2013.01);
Abstract

The present disclosure provides a vertical tunneling random access memory comprising: a first electrode disposed on a base substrate; a second electrode vertically spaced from the first electrode; a floating gate disposed between the first electrode and the second electrode and configured to charge or discharge charges; a tunneling insulating layer disposed between the first electrode and the floating gate; a barrier insulating layer disposed between the floating gate and the second electrode; a contact hole passing through the tunneling insulating layer and the barrier insulating layer for partially exposing the first electrode; a semiconductor pattern extending from the second electrode, along and on a portion of a side wall face defining the contact hole, to the first electrode such that one end of the semiconductor pattern is in contact with the first electrode and the other end of the pattern is in contact with the second electrode.


Find Patent Forward Citations

Loading…