The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Feb. 28, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventor:

Jiansheng Wang, Union City, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); H01J 49/10 (2006.01); H01J 49/04 (2006.01);
U.S. Cl.
CPC ...
H01J 49/105 (2013.01); H01J 49/0031 (2013.01); H01J 49/0431 (2013.01);
Abstract

In an embodiment, a method of measuring nanoparticles from a sample using single particle inductively coupled plasma mass spectrometry (spICPMS) includes separating the nanoparticles from a surface of the sample by: exposing the surface to a first exposure surface of a first liquid medium; and mechanically manipulating the first liquid medium; and measuring the first liquid medium using spICPMS. In an embodiment, a method of detecting nanoparticle contamination in a processing chamber includes removing a first component from the processing chamber subsequent to a processing operation; and measuring first nanoparticles from the first component using spICPMS, comprising: separating the first nanoparticles from a first surface of the first component by: exposing a first portion of the first surface to a first exposure surface of a first liquid medium; and mechanically manipulating the first liquid medium.


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