The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
Feb. 13, 2019
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Mitsuhide Nishimura, Utsunomiya, JP;
Masatoshi Endo, Utsunomiya, JP;
Junichi Motojima, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70641 (2013.01); G03F 7/70516 (2013.01); G03F 7/70591 (2013.01); G03F 7/70716 (2013.01); G03F 7/70775 (2013.01); G03F 9/7026 (2013.01); G03F 9/7034 (2013.01);
Abstract
An exposure apparatus that exposes a substrate is provided. The apparatus includes a stage configured to hold and move the substrate, and a controller configured to control focus driving of the stage based on a measurement value and a correction value obtained for the focus driving of the stage for a shot region on the substrate. The controller is configured to determine the correction value in accordance with an angle of view at a time of exposure.