The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
Jul. 25, 2016
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Assignee:
Merck Patent GmbH, , DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/38 (2006.01); G03F 7/40 (2006.01); H01L 31/04 (2014.01); G03F 7/022 (2006.01); G03F 7/004 (2006.01); G03F 7/023 (2006.01); G03F 7/035 (2006.01); G03F 7/038 (2006.01); G03F 7/00 (2006.01); H01L 21/3205 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); G03F 7/0048 (2013.01); G03F 7/022 (2013.01); G03F 7/0226 (2013.01); G03F 7/0236 (2013.01); G03F 7/035 (2013.01); G03F 7/0381 (2013.01); G03F 7/38 (2013.01); G03F 7/0007 (2013.01); H01L 21/3205 (2013.01); H01L 31/04 (2013.01); H01L 51/5012 (2013.01);
Abstract
A photolithiographic method for fabricating bank structures with improved non-wetting properties to form well regions on a substrate using a photoresist composition comprising a cresol novolak resin, a photoactive diazonaphthoquinone sulfonic ester of a polyhydroxybenzophenone compound with at least one free hydroxyl group, and a non-ionic urethane polyglycol fluorosurfactant. Inkjet methods can be used to deposit active materials into the well areas. Color filter arrays and optoelectronic devices such as OLED devices can be made by this method.