The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Mar. 13, 2017
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Tosiya Asano, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 21/67 (2006.01); G03F 9/00 (2006.01); H01L 21/68 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); G03F 9/7042 (2013.01); G03F 9/7046 (2013.01); H01L 21/67259 (2013.01); H01L 21/68 (2013.01); H01L 21/304 (2013.01); H01L 21/67092 (2013.01);
Abstract

An imprint apparatus forms a pattern on an imprint region of a substrate by bringing a mold into contact with an imprint material on the imprint region and curing the imprint material. The apparatus includes a controller for controlling an alignment operation of adjusting relative position between the mold and the imprint region in a state that the mold is in contact with the imprint material. The alignment operation includes a translation operation of performing relative translation between the imprint region and the mold, and a rotation operation of performing relative rotation between the imprint region and the mold. The rotation operation includes a first operation and a second operation, and a relative rotation direction between the imprint region and the mold in the second operation is opposite to a relative rotation direction between the imprint region and the mold in the first operation.


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