The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Aug. 20, 2019
Applicant:

Elenion Technologies, Llc, New York, NY (US);

Inventors:

Matthew Akio Streshinsky, New York, NY (US);

Ari Novack, New York, NY (US);

Michael J. Hochberg, New York, NY (US);

Assignee:

Elenion Technologies, LLC, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/311 (2006.01); G01N 21/88 (2006.01); G01B 11/30 (2006.01); H01L 21/66 (2006.01); G01R 31/308 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8806 (2013.01); G01B 11/30 (2013.01); G01R 31/311 (2013.01); H01L 22/12 (2013.01); H01L 22/30 (2013.01); G01R 31/308 (2013.01);
Abstract

A test system for determining a surface characteristic of a chip facet comprises a chip, which has a facet and includes a waveguide, a detector, and a processor. The on-chip waveguide is configured to direct test light towards the facet, where a portion of the test light is reflected and a portion of the test light is transmitted. The detector is configured to measure an amount of the reflected portion or the transmitted portion, and the processor is configured to determine a surface characteristic of the facet, such as a facet angle, a facet curvature, and/or a facet roughness, on the basis of the measured amount.


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