The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Aug. 29, 2016
Applicant:

Enplas Corporation, Saitama, JP;

Inventors:

Toshihiko Mochida, Saitama, JP;

Hiroshi Takatori, Saitama, JP;

Assignee:

Enplas Corporation, Saitama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); F21V 5/04 (2006.01); F21S 2/00 (2016.01); H01L 33/60 (2010.01); G02B 19/00 (2006.01); F21Y 115/10 (2016.01); H01L 33/58 (2010.01);
U.S. Cl.
CPC ...
F21S 2/005 (2013.01); F21V 5/04 (2013.01); G02B 3/0006 (2013.01); G02B 19/0028 (2013.01); G02B 19/0061 (2013.01); H01L 33/60 (2013.01); F21Y 2115/10 (2016.08); H01L 33/58 (2013.01);
Abstract

This luminous flux control member has: a plane of incidence having a first incidence plane and a second incidence plane; an emission plane; and a second concavity. The luminous flux control member satisfies the expression h<h+d×cot(θ), where his the space between the apex of the second concavity and a second imaginary line orthogonal to the center axis and that passes through the aperture edge portion, his the space between the second imaginary line and the incidence position of light on the second incidence plane, d is the distance between the incidence position and the apex in the direction orthogonal to the center axis, θis the angle of refraction of light in the incidence position, and θis the angle of the tangent line at the incidence position in relation to the second imaginary line.


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