The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Feb. 20, 2018
Applicant:

Nikon Corporation, Tokyo, JP;

Inventor:

Hiroaki Kii, Kawasaki, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 7/18 (2006.01); F04D 29/02 (2006.01); G01N 21/64 (2006.01); G02B 21/36 (2006.01); F04D 29/053 (2006.01); F04D 29/058 (2006.01); F04D 29/059 (2006.01); F16C 3/02 (2006.01); F16C 35/04 (2006.01);
U.S. Cl.
CPC ...
F04D 29/023 (2013.01); F04D 29/053 (2013.01); F04D 29/058 (2013.01); F04D 29/059 (2013.01); F16C 3/02 (2013.01); G01N 21/6408 (2013.01); G01N 21/6458 (2013.01); G02B 21/367 (2013.01); F05D 2230/41 (2013.01); F05D 2230/90 (2013.01); F05D 2300/2263 (2013.01); F05D 2300/506 (2013.01); F05D 2300/701 (2013.01); F16C 35/04 (2013.01); F16C 2360/44 (2013.01);
Abstract

A certain material irregularly expressed in an observation area is effectively observed. An observing apparatus includes a first observing unit performing a time lapse shooting of a predetermined observation area, a first discriminating unit discriminating whether or not a first material is expressed in the observation area based on an image obtained by the first observing unit, and a second observing unit starting a time lapse shooting relating to a part where the first material is expressed at a timing when the first material is expressed in the observation area, in which a shooting frequency of the time lapse shooting by the second observing unit is higher than a shooting frequency of the time lapse shooting by the first observing unit.


Find Patent Forward Citations

Loading…