The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Sep. 30, 2015
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Mi Sook Lee, Daejeon, KR;

Jung Keun Kim, Daejeon, KR;

Se Jin Ku, Daejeon, KR;

No Jin Park, Daejeon, KR;

Je Gwon Lee, Daejeon, KR;

Eun Young Choi, Daejeon, KR;

Sung Soo Yoon, Daejeon, KR;

Hyung Ju Ryu, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 53/00 (2006.01); C08F 212/08 (2006.01); C08F 220/10 (2006.01); B81C 1/00 (2006.01); C08F 216/12 (2006.01); C08F 220/26 (2006.01); C08F 220/30 (2006.01); C08F 297/00 (2006.01); C08F 299/00 (2006.01); C08J 5/18 (2006.01); B05D 1/00 (2006.01); B05D 3/00 (2006.01); C08F 2/14 (2006.01); C08F 32/06 (2006.01); C08F 293/00 (2006.01); C08F 299/02 (2006.01); C08G 61/08 (2006.01); C08G 61/12 (2006.01); C08J 7/12 (2006.01); C08L 53/02 (2006.01); C09D 153/00 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); H01L 21/027 (2006.01); H01L 21/3105 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C08L 53/005 (2013.01); B05D 1/005 (2013.01); B05D 3/007 (2013.01); B81C 1/00428 (2013.01); C08F 2/14 (2013.01); C08F 32/06 (2013.01); C08F 212/08 (2013.01); C08F 216/12 (2013.01); C08F 220/10 (2013.01); C08F 220/26 (2013.01); C08F 220/30 (2013.01); C08F 293/00 (2013.01); C08F 293/005 (2013.01); C08F 297/00 (2013.01); C08F 299/00 (2013.01); C08F 299/024 (2013.01); C08G 61/08 (2013.01); C08G 61/12 (2013.01); C08J 5/18 (2013.01); C08J 7/123 (2013.01); C08L 53/00 (2013.01); C08L 53/02 (2013.01); C09D 153/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/0046 (2013.01); G03F 7/039 (2013.01); G03F 7/091 (2013.01); G03F 7/16 (2013.01); G03F 7/162 (2013.01); G03F 7/165 (2013.01); G03F 7/2004 (2013.01); G03F 7/30 (2013.01); H01L 21/0273 (2013.01); H01L 21/31055 (2013.01); H01L 21/31056 (2013.01); H01L 21/31058 (2013.01); B81C 2201/0149 (2013.01); B82Y 40/00 (2013.01); C01P 2002/70 (2013.01); C07B 2200/00 (2013.01); C08F 2220/301 (2013.01); C08F 2438/03 (2013.01); C08G 2261/1424 (2013.01); C08G 2261/1426 (2013.01); C08G 2261/332 (2013.01); C08G 2261/3324 (2013.01); C08G 2261/40 (2013.01); C08G 2261/418 (2013.01); C08J 2353/00 (2013.01);
Abstract

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.


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