The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
Feb. 27, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Assignee:
LG CHEM, LTD., Seoul, KR;
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/00 (2006.01); C08F 4/00 (2006.01); C08G 63/66 (2006.01); C08G 63/685 (2006.01); G03F 7/032 (2006.01); G03F 7/038 (2006.01); C08F 283/02 (2006.01); C08F 2/50 (2006.01); G03F 7/105 (2006.01); C08G 65/333 (2006.01); G03F 7/00 (2006.01); C08F 299/04 (2006.01); G03F 7/027 (2006.01); C08F 220/26 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
C08G 63/66 (2013.01); C08F 2/50 (2013.01); C08F 220/26 (2013.01); C08F 283/02 (2013.01); C08F 299/04 (2013.01); C08G 63/685 (2013.01); C08G 65/333 (2013.01); G03F 7/0007 (2013.01); G03F 7/027 (2013.01); G03F 7/032 (2013.01); G03F 7/038 (2013.01); G03F 7/0388 (2013.01); G03F 7/105 (2013.01); H01L 51/5284 (2013.01);
Abstract
A polymer resin compound, a photosensitive resin composition for a black bank comprising the polymer resin compound, and a method for manufacturing a black bank. The method comprises coating the photosensitive resin composition on a substrate to form a photosensitive resin film; exposing and developing the photosensitive resin film to pattern the coated photosensitive resin film; and curing the patterned photosensitive resin film.