The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2020
Filed:
Jun. 28, 2018
Applicant:
Acuity Polymers, Inc., Rochester, NY (US);
Inventor:
James A. Bonafini, Jr., Kendall, NY (US);
Assignee:
Acuity Polymers, Inc., Rochester, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
C08F 220/24 (2006.01); B29K 33/00 (2006.01); B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
C08F 220/24 (2013.01); B29D 11/00038 (2013.01); B29K 2033/08 (2013.01); B29K 2995/0065 (2013.01); C08F 2800/20 (2013.01);
Abstract
A method of producing an ultra-high Dk material includes contacting and reacting a fluoroalkyl methacrylate; an alkyl glycol dimethacrylate; a hydrophilic agent, such as methacrylic acid; a hydroxyalkyl tris(trimethylsiloxy)silane; a hydroxyalkyl terminated polydimethylsiloxane; and styrylethyltris(trimethylsiloxy)silane. The reaction is conducted within an inert atmosphere at a pressure of at least 25 pounds per square inch (PSI) and for a period of time and at a temperature sufficient to produce the ultra-high Dk material.