The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Sep. 07, 2017
Applicant:

Covestro Deutschland Ag, Leverkusen, DE;

Inventors:

Hans-Detlef Arntz, Overath, DE;

Torsten Hagen, Essen, DE;

Ernst Felske, Neuss, DE;

Assignee:

Covestro Deutschland AG, Leverkusen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 263/16 (2006.01); C07C 267/00 (2006.01); C08G 18/80 (2006.01); C08G 18/32 (2006.01); C08G 18/79 (2006.01); C07C 263/18 (2006.01);
U.S. Cl.
CPC ...
C07C 263/16 (2013.01); C07C 263/18 (2013.01); C07C 267/00 (2013.01); C08G 18/3206 (2013.01); C08G 18/797 (2013.01); C08G 18/8019 (2013.01);
Abstract

The invention relates to a process for preparing liquid, storage-stable isocyanate mixtures having carbodiimide (CD) and/or uretonimine (UI) groups or prepolymers derived therefrom, wherein (i) in a first step, a starting isocyanate which is an organic isocyanate or a mixture of two or more organic isocyanates is partly carbodiimidized with a catalyst K of the formula cyclo-CHP(O)R, where the substituent R is a saturated or unsaturated, optionally substituted, especially halogen-substituted, organic radical, and then (ii) in a second step, the carbodiimidization reaction is stopped at a temperature of ≤80° C. by adding a stopper, the stopper used being an organic silane S of the general formula HSiX, where n is a natural number in the range from 1 to 3, where X is a saturated or unsaturated, optionally substituted, especially halogen-substituted, organic radical.


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