The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2020

Filed:

Dec. 01, 2015
Applicant:

Sigma-technology Inc., Ibaraki, JP;

Inventor:

Yoshiaki Tachibana, Hitachinaka, JP;

Assignee:

SIGMA-TECHNOLOGY INC., Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01F 1/00 (2006.01); B01F 15/06 (2006.01); B01F 3/04 (2006.01); B01F 5/02 (2006.01); B05D 3/10 (2006.01); B05D 1/02 (2006.01); B08B 3/02 (2006.01); B08B 3/08 (2006.01); H01L 21/304 (2006.01); H01L 21/027 (2006.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01); B05B 7/32 (2006.01); B05B 7/16 (2006.01);
U.S. Cl.
CPC ...
B08B 3/02 (2013.01); B01F 1/00 (2013.01); B01F 1/0005 (2013.01); B01F 3/04 (2013.01); B01F 3/04049 (2013.01); B01F 5/02 (2013.01); B01F 5/0231 (2013.01); B01F 15/06 (2013.01); B05B 7/16 (2013.01); B05B 7/1666 (2013.01); B05B 7/32 (2013.01); B05D 1/02 (2013.01); B05D 3/10 (2013.01); B08B 3/08 (2013.01); H01L 21/027 (2013.01); H01L 21/02052 (2013.01); H01L 21/0331 (2013.01); H01L 21/304 (2013.01);
Abstract

Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C., the mean particle size of the micro/nano-bubbles when measured by an ice embedding method using a cryo-transmission electron microscope being 100 nm or smaller, preferably 30 nm or smaller, and also preferably the density of such bubbles being 10or more bubbles per 1 mL.


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