The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Dec. 18, 2017
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Yonathan Aflalo, Tel Aviv, IL;
Nathan Henri Levy, Givatayim, IL;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/33 (2017.01); G06T 7/593 (2017.01); G06T 3/00 (2006.01); H04N 13/128 (2018.01); H04N 13/271 (2018.01); H04N 13/282 (2018.01);
U.S. Cl.
CPC ...
G06T 7/337 (2017.01); G06T 3/0068 (2013.01); G06T 7/593 (2017.01); G06T 2207/10028 (2013.01); G06T 2207/20221 (2013.01); H04N 13/128 (2018.05); H04N 13/271 (2018.05); H04N 13/282 (2018.05);
Abstract
In various embodiments of an image processing method and apparatus, first and second point clouds representing respective images of a scene/object from different viewpoints are obtained. Extracted features points from the first point cloud are matched with extracted feature points from the second point cloud, using depth based weighting, as part of an ICP initiation process. The first and second point clouds are then further ICP processed using results of the initiation process to generate at least one coordinate-transformed point cloud.