The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2020

Filed:

May. 12, 2017
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Ordos Yuansheng Optoelectronics Co., Ltd., Ordos, Inner Mongolia, CN;

Inventors:

Fengli Ji, Beijing, CN;

Shanshan Bai, Beijing, CN;

Yinan Liang, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/42 (2012.01); C23C 14/04 (2006.01); C23C 16/04 (2006.01); G03F 1/66 (2012.01); G03F 1/68 (2012.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
G03F 1/42 (2013.01); C23C 14/042 (2013.01); C23C 16/042 (2013.01); G03F 1/66 (2013.01); G03F 1/68 (2013.01); H01L 51/56 (2013.01);
Abstract

A mask frame assembly and an evaporation apparatus are disclosed. The mask frame assembly comprises a frame and a mask plate fixed on the frame. The mask frame assembly is provided with alignment marks, which comprise a first alignment hole arranged in the frame and a second alignment hole arranged in the mask plate. The first alignment hole is a through hole; or the first alignment hole is a blind hole, the deepest position at a bottom of the blind hole does not overlap with an orthographic projection of the second alignment hole on the frame. The mask frame assembly effectively solves a problem in which liquid residuals in alignment holes of the frame interfere with alignment.


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