The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Aug. 21, 2012
Applicants:
Sean R. Kirkpatrick, Littleton, MA (US);
Allen R. Kirkpatrick, Carlisle, MA (US);
Inventors:
Sean R. Kirkpatrick, Littleton, MA (US);
Allen R. Kirkpatrick, Carlisle, MA (US);
Assignee:
Exogenesis Corporation, Billerica, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); H01J 37/08 (2006.01); H01J 37/305 (2006.01); G01N 23/225 (2018.01);
U.S. Cl.
CPC ...
G01N 23/00 (2013.01); H01J 37/08 (2013.01); H01J 37/305 (2013.01); G01N 23/225 (2013.01); H01J 2237/0041 (2013.01); H01J 2237/0812 (2013.01); H01J 2237/3151 (2013.01);
Abstract
Apparatus and methods are disclosed for employing an accelerated neutral beam derived from an accelerated gas cluster ion beam as a physical etching beam for providing reduced material mixing at the etched surface, compared to previous techniques. This results in the ability to achieve improved depth profile resolution in measurements by analytical instruments such as SIMS and XPS (or ESCA) analytical instruments.