logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10626287 B1

PDFFull Text
Date of Patent:
Apr. 21, 2020

Filed:

Dec. 14, 2016

Resin composition for underlayer film formation, layered product, method for forming pattern, and process for producing device

Applicant:

Fujifilm Corporation, Minato-ku, Tokyo, JP;

Inventors:

Hirotaka Kitagawa, Haibara-gun, JP;

Tadashi Oomatsu, Haibara-gun, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Kuo Liang Peng

Int. Cl.
CPC ...
C09D 133/14 (2006.01); C08F 8/14 (2006.01); B32B 27/30 (2006.01); C08F 290/14 (2006.01); C08F 290/06 (2006.01); G03F 7/00 (2006.01); G03F 7/09 (2006.01); B05D 1/00 (2006.01); B05D 3/06 (2006.01); B05D 3/10 (2006.01); B05D 3/12 (2006.01); B29C 59/02 (2006.01); B29K 67/00 (2006.01); B29L 9/00 (2006.01);
U.S. Cl.
CPC ...
C09D 133/14 (2013.01); B05D 1/005 (2013.01); B05D 3/06 (2013.01); B05D 3/107 (2013.01); B05D 3/12 (2013.01); B29C 59/022 (2013.01); B29C 59/026 (2013.01); B32B 27/30 (2013.01); C08F 8/14 (2013.01); C08F 290/062 (2013.01); C08F 290/142 (2013.01); G03F 7/0002 (2013.01); G03F 7/0007 (2013.01); G03F 7/094 (2013.01); B29K 2067/04 (2013.01); B29L 2009/005 (2013.01); C08F 2438/03 (2013.01);
Abstract

A resin composition for underlayer film formation capable of forming an underlayer film having good adhesiveness and excellent surface flatness, a layered product, a method for forming a pattern and a process for producing a device are provided. The resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and a group represented by General Formula (B), and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represents an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.

Find Patent Forward Citations

Loading…