The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Apr. 05, 2019
Basf SE, Ludwigshafen, DE;
BASF SE, Ludwigshafen, DE;
Abstract
Disclosed herein is a method for forming a surface relief microstructure, including the steps of A) applying a curable composition to at least a portion of the frontside of the paper substrate, B) contacting at least a portion of the curable composition with surface relief microstructure, C) curing the composition by using at least one UV lamp which is arranged on the backside of the paper substrate, and D) depositing a metallic layer, and optionally a layer of a transparent high refractive index material, on at least a portion of the cured composition, wherein the UV lamp has an emission peak in a UV-A range of 320 nm to 400 nm and additionally in a near VIS range of 400 nm to 450 nm, the curable composition comprises a photoinitiator which absorbs in the UV-A range and also in the near VIS range.