The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Oct. 10, 2017
The Board of Trustees of the University of Illinois, Urbana, IL (US);
James Gary Eden, Champaign, IL (US);
Sung-Jin Park, Champaign, IL (US);
Charles Shin, Champaign, IL (US);
Andrey Mironov, Urbana, IL (US);
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Abstract
A method for generating a hybrid reaction flows feedstock gas that is also a plasma medium through microchannels. Plasma is generated with the plasma medium via excitation with a time-varying voltage. UV or VUV emissions are generated at a wavelength selected to break a chemical bond in the feedstock gas. The UV or VUV emissions are directed into the microchannels to interact with the plasma medium and generate a reaction product from the plasma medium. A hybrid reactor device includes a microchannel plasma array having inlets and outlets for respectively flowing gas feedstock into and reaction product out of the microchannel plasma array. A UV or VUV emission lamp has its emissions directed into microchannels of the microchannel plasma array. Electrodes ignite plasma in the microchannels and stimulating the UV or VUV emission lamp to generate UV or VUV emissions. One common or plural phased time-varying voltage sources drive the plasma array and the UV or VUV emission lamp.