The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2020

Filed:

Mar. 31, 2017
Applicant:

GM Global Technology Operations Llc, Detroit, MI (US);

Inventors:

Xingcheng Xiao, Troy, MI (US);

Hongliang Wang, Sterling Heights, MI (US);

Qinglin Zhang, Novi, MI (US);

Mark W. Verbrugge, Troy, MI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/18 (2006.01); H01M 4/1395 (2010.01); H01M 4/134 (2010.01); H01M 4/38 (2006.01); H01M 4/04 (2006.01); B23K 26/362 (2014.01); B23K 26/361 (2014.01); B23K 101/36 (2006.01); H01M 4/02 (2006.01); H01M 10/052 (2010.01);
U.S. Cl.
CPC ...
H01M 4/1395 (2013.01); B23K 26/361 (2015.10); B23K 26/362 (2013.01); H01M 4/0433 (2013.01); H01M 4/0435 (2013.01); H01M 4/0471 (2013.01); H01M 4/134 (2013.01); H01M 4/386 (2013.01); H01M 4/387 (2013.01); B23K 2101/36 (2018.08); H01M 10/052 (2013.01); H01M 2004/027 (2013.01); Y02E 60/122 (2013.01); Y02T 10/7011 (2013.01);
Abstract

A high performance electrode for an electrochemical cell including electroactive materials having a large charge capacity and that undergo substantial volumetric expansion and contraction during cycling of the electrochemical cell and a method for making the high performance electrode are provided. The electroactive material of the high performance electrode may have a thickness greater than or equal to about 1 μm. Methods of forming the high performance electrodes includes patterning the electroactive material to form a plurality of void spaces using a high-speed process selected from the group consisting of: laser ablation, electron beam machining, ion beam milling, roll forming, embossing, lithography, and combinations thereof. The plurality of void spaces accommodates the volumetric expansion and contraction to minimize cracking and damage to the electrode during cycling of the electrochemical cell.


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