The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2020

Filed:

Aug. 06, 2018
Applicant:

Sumitomo Electric Industries, Ltd., Osaka, JP;

Inventor:

Isao Makabe, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/778 (2006.01); H01L 29/20 (2006.01); H01L 29/66 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7787 (2013.01); H01L 29/0843 (2013.01); H01L 29/66462 (2013.01); H01L 29/2003 (2013.01);
Abstract

A process of forming a semiconductor device primarily made of nitride semiconductor materials is disclosed. The process includes steps of: (a) growing a semiconductor stack including a channel layer and a barrier layer sequentially on a substrate, where the channel layer is made of gallium nitride (GaN); (b) patterning a mask on the barrier layer; (c) etching a portion of the barrier layer and a portion of the channel layer with the mask to form a recess in the semiconductor stack; and (d) growing a contact layer selectively within the recess with nitrogen (N) used as a carrier gas at a maximum temperature of 1000° C.


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