The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Jan. 24, 2018
Honeywell International Inc., Morris Plains, NJ (US);
James L. Tucker, Clearwater, FL (US);
Honeywell International Inc., Morris Plains, NJ (US);
Abstract
Techniques to determine whether the design of integrated circuit (IC) has been tampered with during wafer manufacturing by using an enhanced library and layout methodology. The enhanced library may include location sensitive cells networked together in a mesh architecture where paths through the mesh can be used to detect relative position of location sensitive cells. The techniques further include algorithms that fill any unused space on an IC with additional elements from the enhanced library to minimize the opportunity to modify the IC by including additional circuit function or manipulating the layout. By physically locking down the circuit placement such that there is no available area and gives improved ability to detect changes in the physical location behavior of the circuit, therefore reduces the risk that unauthorized circuit manipulation will go undetected.