The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Nov. 25, 2015
Beijing Naura Microelectronics Equipment Co., Ltd., Beijing, CN;
Qing She, Beijing, CN;
Peng Chen, Beijing, CN;
Mengxin Zhao, Beijing, CN;
Peijun Ding, Beijing, CN;
Kui Xu, Beijing, CN;
Guodong Bian, Beijing, CN;
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing, CN;
Abstract
A precleaning chamber () and a plasma processing apparatus, comprising a cavity () and a dielectric window (') disposed at the top of the cavity (), a base () and a process assembly () surrounding the base () are disposed in the precleaning chamber (), and the base (), the process assembly () and the dielectric window (′) together form a process sub-cavity () above the base (); and a space of the cavity () located below the base () is used as a loading/unloading sub-cavity (), the precleaning chamber () further comprises a gas is device (), the gas inlet device () comprises a gas inlet (), and the gas inlet () is configured to directly transport a process gas into the process sub-cavity () from above the process assembly (). The precleaning chamber () not only shortens the gas inlet path of the process gas, but also reach a desired plasma density under the conditions where a relatively small amount of process gas is introduced, thereby reducing the usage cost.