The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Jun. 14, 2018
Tsinghua University, Beijing, CN;
Hon Hai Precision Industry Co., Ltd., New Taipei, TW;
Mo Chen, Beijing, CN;
Li-Hui Zhang, Beijing, CN;
Qun-Qing Li, Beijing, CN;
Shou-Shan Fan, Beijing, CN;
Tsinghua University, Beijing, CN;
HON HAI PRECISION INDUSTRY CO., LTD., New Taipei, TW;
Abstract
A method of making nanoscale channels including: providing a substrate, locating a photoresist mask layer on the substrate, the thickness of the photoresist mask layer equals H; forming a patterned mask layer by exposing and developing the photoresist mask layer, the patterned mask layer includes a plurality of parallel and spaced stripe masks, the spacing between adjacent stripe masks equals L; depositing a first thin film layer on the substrate in a first direction, the thickness of the first thin film layer equals D, a first angle between the first direction and a direction in the thickness of the stripe masks equals θ, θ<tan(L/H); depositing a second thin film layer on the substrate in a second direction, a second angle between the second direction and the direction in the thickness of the stripe masks equals θ, θ<tan[L/(H+D)], 0<Htanθ+(H+D)tanθ−L<10 nm.