The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Nov. 17, 2016
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Ayumi Higuchi, Kyoto, JP;
Akihisa Iwasaki, Kyoto, JP;
Assignee:
SCREEN Holdings Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/3213 (2006.01); B05B 15/25 (2018.01); B05B 12/14 (2006.01); G05D 11/13 (2006.01); B01F 3/08 (2006.01); B01F 13/10 (2006.01); B01F 15/00 (2006.01); B05B 1/02 (2006.01); B08B 3/02 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); H01L 21/311 (2006.01); B05D 1/02 (2006.01); B05D 1/00 (2006.01); B05B 12/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); B01F 3/088 (2013.01); B01F 13/1027 (2013.01); B01F 15/00311 (2013.01); B05B 1/02 (2013.01); B05B 12/1418 (2013.01); B05B 15/25 (2018.02); B08B 3/02 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); G05D 11/132 (2013.01); H01L 21/02063 (2013.01); H01L 21/32134 (2013.01); H01L 21/67051 (2013.01); H01L 21/67253 (2013.01); B01F 2003/0896 (2013.01); B05B 12/02 (2013.01); B05D 1/002 (2013.01); B05D 1/02 (2013.01); H01L 21/31144 (2013.01);
Abstract
A substrate processing apparatus includes a spray nozzle that allows a plurality of liquid droplets to collide with a substrate held by a spin chuck, a liquid piping that supplies a mixed liquid of water and a chemical liquid to the spray nozzle, a first flow control valve and a second flow control valve each of which changes the concentration of the chemical liquid in the mixed liquid, and a controller that causes the liquid piping to supply the mixed liquid having a concentration of the chemical liquid determined in accordance with a substrate to be processed.