The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Nov. 24, 2015
Applicant:
Spts Technologies Limited, Newport, GB;
Inventors:
Stephen R Burgess, Gwent, GB;
Anthony Paul Wilby, Bristol, GB;
Assignee:
SPTS Technologies Limited, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/04 (2006.01); H01J 37/34 (2006.01); C23C 14/34 (2006.01); H01J 37/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32467 (2013.01); C23C 14/046 (2013.01); C23C 14/34 (2013.01); H01J 37/18 (2013.01); H01J 37/321 (2013.01); H01J 37/32862 (2013.01); H01J 37/34 (2013.01);
Abstract
A plasma etching apparatus is for etching a substrate and includes at least one chamber, a substrate support positioned within the at least one chamber, and a plasma production device for producing a plasma for use in etching the substrate. The plasma production device comprises an electrically conductive coil which is positioned within the at least one chamber, and the coil is formed from a metallic material which can be sputtered onto an interior surface of the at least one chamber.